Ercentage towards the SRO layers with decrease percentages, generating the gradual
Ercentage towards the SRO layers with decrease percentages, generating the gradual interfaces. However, the Si content material inside the SRN layer for MLA and MLB was about 49.1 0.2 and 50.0 0.four at. , respectively. It was previously shown that, in the course of the deposition of SRN, O atoms are incorporated into the single SRN films [36]. Moreover, the oxygen content material varied together with the RN value; the greater the RN value, the larger the O content material. A diffusion of N, Si and O atoms towards the SRN/SRO interface was also observed resulting from the thermal annealing forming an oxynitride layer (SiON) with progressively rising contents on the diverse components. Similar final results had been reported inside the literature for the formation of SiON in the interface of an SRN/SRO bilayer [37].Components 2021, 14, x FOR PEER Assessment Materials 2021, 14, 6582 Supplies 2021, 14, x FOR PEER REVIEW4 of 10 4 of 11 four ofFigure 1. XPS depth profile for Si2p, O1s, N1s signal for (a) MLA and (b) MLB soon after thermal annealing. Figure 1. XPS depth profile for Si2p, O1s, N1s signal for (a) MLA and (b) MLB after thermal annealing. Figure 1. XPS depth profile for Si2p, O1s, N1s signal for (a) MLA and (b) MLB immediately after thermal annealing.three.two. Structural Chracterization 3.two. Structural Chracterization three.two. Structural ChracterizationtheMLs was studied with STEM and HRTEM to observe the The microstructure on the microstructure of the MLs was studied with STEM and HRTEM to observe the presenceof Si-ncs formationthein thewas studied with STEM and2a,b shows a observe the presence microstructure of in the distinct MLML structures. Figure 2a,b shows a microThe of Si-ncs formation MLs different structures. Figure HRTEM to micrograph graph in the cross-section of in MLA and SBP-3264 supplier respectively, exactly where every every single SRO SRO layof the cross-section of the MLA and MLB, MLB, structures. Figure of theof the layers is presence of Si-ncs formation thethe unique ML respectively, where2a,b shows a microlabeled with itswithvalue. with the MLA imply thickness of every single whereobtainedthe suggests of ers is labeled RO its RO value. The and MLB, respectively, SRO each of obtained by graph from the cross-section The mean thickness of every SRO layer waslayer was by SRO laystatistical evaluation its RO worth. The imply thickness of every The layer was obtainedless indicates of statistical analysis of many STEM The thickness of thickness of each and every by ers is labeled withof various STEM micrographs.micrographs.SROeach SRO layer was SRO than expected. than analysishand, different dark various dark zones (marked by BMS-8 In Vitro circles) layer of much less Around the other of a variety of STEM micrographs. The circles) were observed meanswasstatistical expected. On the other hand,zones (marked bythickness of each SRO in thewas less thanthe micrographs,presence with the presence of Si-agglomeratesby circles) have been micrographs, indicating the other hand, unique dark within the ML structure, layer observed in anticipated. On theindicating Si-agglomerateszones (marked inside the in particular for MLB. The Si-NPs area couldSi-NPs presence of Si-agglomerates within the ML observed in particular for MLB. The be the region could in the SRO10 /Si-substrate had been structure, in the micrographs, indicating clearly observedbe clearly observed at the (p-Si)10interface of MLA (Figure 2a). Si-NPs (Figure 2a). Si-NPs clearlynot present in the SRO /Si-substrate (p-Si) interface The Si-NPs area could be have been but Si-ncs were ML structure, specifically for MLB. of MLAwere not present at the MLB,observed at the.